|
|
Photocatalytic activity of ZnO films with micro-grid
structure |
Chunzhi LI , Wenwen WANG , Junying ZHANG , Hailing ZHU , Weiwei ZHANG , Tianmin WANG , |
School of Physics and
Nuclear Energy Engineering, Beihang University, Beijing 100191, China; |
|
|
Abstract A layer of zinc oxide (ZnO) micro-grid was deposited on the surface of ZnO film using the DC reactive magnetron sputtering method and the micro-sphere lithography technique on glass substrates. Samples of this layer were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), and ultraviolet-visible light spectroscopy. X-ray diffraction showed the high crystallinity of ZnO film and the regular arrangement of the micro-grid. The micro-grid ZnO has a lower specular reflection and a higher diffuse reflection, allowing incident light to reflect two or three times to enhance the usage of light. Photocatalytic degradation experiments on methylene blue using both ZnO micro-grid and ordinary film showed that the ZnO micro-grid has better photocatalytic properties than ordinary film. The ZnO micro-grid enhanced the photocatalytic efficiency of ZnO film by 28% with a degradation time of 300min.
|
Keywords
Photocatalysis
ZnO micro-grid
polystyrene latex spheres template
diffuse reflection
|
Issue Date: 05 September 2009
|
|
|
Mitsuyu T, Ono S, Wasa K. Structures and SAW properties of rf-sputtered single-crystalfilms of ZnO on sapphire. Journal of AppliedPhysics, 1980, 51: 2464―2470
doi: 10.1063/1.328019
|
|
Potter R R. Enhanced photocurrent ZnO/CdS/CuInSe2 solarcells. Solar Cells, 1986, 16: 521―527
doi: 10.1016/0379-6787(86)90107-9
|
|
Igasaki Y, Saito H. The effects of depositionrate on the structural and electrical properties of ZnO: Al filmsdeposited on (1120) oriented sapphire substrates. ?Journal of Applied Physics, 1991, 70: 3613―3619
doi: 10.1063/1.349258
|
|
Pizzini S, Buttá N, Narducci D, Palladino M. Thick film ZnO resistive gas sensors. Journal of the Electrochemical Society, 1989, 136: 1945―1948
doi: 10.1149/1.2097092
|
|
van de Pol F C M, Blom F R, Popma Th J A. R. F. planar magnetron sputtered ZnO films. Thin Solid Films, 1991, 204: 349―364
doi: 10.1016/0040-6090(91)90074-8
|
|
Peng F, Chen S H, Zhang L, Wang H J, Xie Z Y. Preparation of visible- light responsenano-sized ZnO film and its photocatalytic degradation to methyl orange. Journal of Chemical Engineering, 2005, 21: 944―948
|
|
Fujishima A, Honda K. Electrochemical photolysisof water at semiconductor electrode. Nature, 1972, 238: 37―38
doi: 10.1038/238037a0
|
|
Peng F, Ren Y Q. Preparation of nano-TiO2-SnO2 composite film and itsphotocatalytic activity for toluene degradation. Chinese Journal of Catalysis, 2003, 24: 243―247 (in Chinese)
|
|
Nishizawa S, Tsurumi T, Hyodo H, Ishibashi Y, Ohashi N, Yamane M, Fukunaga O. Structural changes in ZnO/ NiO artificial superlattices made by ionbeam sputtering. Thin Solid Films, 1997, 302: 133―139
doi: 10.1016/S0040-6090(97)00008-4
|
|
Ataev B M, Bagamadova A M, Djabrailov A M, Mamedov V V, Rabadanov R A. Highly conductive and transparentGa-doped epitaxial ZnO films on sapphire by CVD. Thin Solid Films, 1995, 260: 19―20
doi: 10.1016/0040-6090(94)09485-3
|
|
Joseph B, Gopchandran K G, Thomas P V, Koshy Peter, Vaidyan V K. Study on the chemical spraydeposition of zinc oxide thin films and their structural and electricalproperties. Materials Chemistry and Physics, 1999, 58: 71―77
doi: 10.1016/S0254-0584(98)00257-0
|
|
Jia R, Wu G M, Song S Q. ZnO-based on thin film varistor prepared by spray pyrolysis. Journal of the Chinese Ceramic Society, 1999, 27 (4): 505―507 (in Chinese)
|
|
Bao D H, Gu H S, Kuang A X. Sol-gel derived c-axis oriented ZnO thin films. Thin Solid Films, 1998, 312: 37―39
doi: 10.1016/S0040-6090(97)00302-7
|
|
Ishizaki H, Imaizumi M, Matsuda S, Izaki M, Ito T. Incorporation of boron in ZnO film froman aqueous solution containing zinc nitrate and dimethylamine-boraneby electrochemical reaction. Thin SolidFilms, 2002, 411:65―68
doi: 10.1016/S0040-6090(02)00189-X
|
|
Li Z W, Gao W. ZnO Thin films with DC andRF reactive sputtering. Materials Letters, 2004, 58:1363―1370
doi: 10.1016/j.matlet.2003.09.028
|
|
Pan F, Zhang J Y, Cai C, Wang T M. Influenceof metal (Au, Ag) micro-grid on the photocatalytic activity of TiO2 film. Catalysis Letters, 2008, 123: 51―55
doi: 10.1007/s10562-007-9392-2
|
|
Wang W W, Diao X G, Wang Z, Yang M, Wang T M, Wu Z. Preparation and characterization of high-performance direct currentmagnetron sputtered ZnO: Al films. ThinSolid Films, 2005, 491: 54―60
doi: 10.1016/j.tsf.2005.05.021
|
|
Chu W. Modeling the quantum yields of herbicide 2,4-D decay in UV/H2O2 process. Chemosphere, 2001, 44: 935―941
doi: 10.1016/S0045-6535(00)00556-7
|
|
Viewed |
|
|
|
Full text
|
|
|
|
|
Abstract
|
|
|
|
|
Cited |
|
|
|
|
|
Shared |
|
|
|
|
|
Discussed |
|
|
|
|