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Frontiers of Mechanical Engineering

ISSN 2095-0233

ISSN 2095-0241(Online)

CN 11-5984/TH

邮发代号 80-975

2019 Impact Factor: 2.448

Frontiers of Mechanical Engineering  2015, Vol. 10 Issue (1): 1-6   https://doi.org/10.1007/s11465-015-0325-2
  本期目录
Eddy current measurement of the thickness of top Cu film of the multilayer interconnects in the integrated circuit (IC) manufacturing process
Zilian QU, Yonggang MENG(), Qian ZHAO
State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, China
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Abstract

This paper proposes a new eddy current method, named equivalent unit method (EUM), for the thickness measurement of the top copper film of multilayer interconnects in the chemical mechanical polishing (CMP) process, which is an important step in the integrated circuit (IC) manufacturing. The influence of the underneath circuit layers on the eddy current is modeled and treated as an equivalent film thickness. By subtracting this equivalent film component, the accuracy of the thickness measurement of the top copper layer with an eddy current sensor is improved and the absolute error is 3 nm for sampler measurement.

Key wordsCMP    eddy current    multilayer wafer    Cu interconnects    equivalent unit
收稿日期: 2014-12-22      出版日期: 2015-04-01
Corresponding Author(s): Yonggang MENG   
 引用本文:   
. [J]. Frontiers of Mechanical Engineering, 2015, 10(1): 1-6.
Zilian QU, Yonggang MENG, Qian ZHAO. Eddy current measurement of the thickness of top Cu film of the multilayer interconnects in the integrated circuit (IC) manufacturing process. Front. Mech. Eng., 2015, 10(1): 1-6.
 链接本文:  
https://academic.hep.com.cn/fme/CN/10.1007/s11465-015-0325-2
https://academic.hep.com.cn/fme/CN/Y2015/V10/I1/1
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Layer Width/μm Space/μm
1st layer 0.8 10
2nd layer 1.2 10
3rd layer 1.5 10
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