SiC/Mg multilayer reflective mirror for He-II radiation at 30.4 nm and its thermal stability

doi:10.1007/s12200-008-0028-y

Front Optoelec Chin

2008, Vol. 1

Issue (3-4) : 305-308 https://doi.org/10.1007/s12200-008-0028-y

Research article

SiC/Mg multilayer reflective mirror for He-II radiation at 30.4 nm and its thermal stability

Jingtao ZHU¹(

), Da XU¹, Shumin ZHANG¹, Wenjuan WU¹, Zhong ZHANG¹, Fengli WANG¹, Bei WANG¹, Cunxia LI¹, Yao XU¹, Zhanshan WANG¹, Lingyan CHEN¹, Hongjun ZHOU², Tonglin HUO²

1. Institute of Precision Optical Engineering and Technology, Physics Department, Tongji University; 2. National Synchrotron Radiation Laboratory, University of Science and Technology of China

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Abstract

In applications of solar physics, extreme ultraviolet imaging of solar corona by selecting the He-II (λ = 30.4 nm) emission line requires high reflectivity multilayer mirrors. Some material combinations were studied to design the mirrors working at a wavelength of 30.4 nm, including SiC/Mg, B₄C/Mg, C/Mg, C/Al, Mo/Si, B₄C/Si, SiC/Si, C/Si, and Sc/Si. Based on optimization of the largest reflectivity and the narrowest width for the multilayer mirror, a SiC/Mg material combination was selected as the mirror and fabricated by a magnetron sputtering system. The layer thicknesses of the SiC/Mg multilayer were measured by an X-ray diffractometer. Reflectivities were then measured on beamline U27 at the National Synchrotron Radiation Laboratory (NSRL) in Hefei, China. At a wavelength of 30.4 nm, the measured reflectivity is as high as 38.0%. Furthermore, a series of annealing experiments were performed to investigate the thermal stability of the SiC/Mg multilayer.

Keywords thin film optics solar He-II radiation extreme ultraviolet multilayer reflective mirror magnetron sputtering synchrotron radiation

Corresponding Author(s): ZHU Jingtao,Email:jtzhu@mail.tongji.edu.cn

Issue Date: 05 September 2009

Cite this article:

Jingtao ZHU,Da XU,Shumin ZHANG, et al. SiC/Mg multilayer reflective mirror for He-II radiation at 30.4 nm and its thermal stability[J]. Front Optoelec Chin, 2008, 1(3-4): 305-308.

URL:

https://academic.hep.com.cn/foe/EN/10.1007/s12200-008-0028-y
https://academic.hep.com.cn/foe/EN/Y2008/V1/I3-4/305

Fig0 Optical constant of material at wavelength of 30.4 nm

Tab0 Peak reflectivities and bandwidths(FWHM) at wavelength of 30.4 nm and incident angle of 10° for the 30-pair multilayers shown in Fig. 2

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