Simple technique to fabricate microscale and nanoscale silicon waveguide devices

doi:10.1007/s12200-009-0049-1

Front Optoelec Chin

2009, Vol. 2

Issue (3) : 308-311 https://doi.org/10.1007/s12200-009-0049-1

RESEARCH ARTICLE

Simple technique to fabricate microscale and nanoscale silicon waveguide devices

Yao CHEN^1,2, Junbo FENG², Zhiping ZHOU^2,3,4(

), Christopher J. SUMMERS⁵, David S. CITRIN^4,6, Jun YU¹

1. Department of Electronic Science and Technology, Huazhong University of Science and Technology, Wuhan 430074, China; 2. Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China; 3. State Key Laboratory on Advanced Optical Communication Systems and Networks, Peking University, Beijing 100871, China; 4. School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, GA 30332-0250, USA; 5. School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, GA 30332-0245, USA; 6. Unité Mixte Internationale 2958 Georgia Tech-CNRS, Georgia Tech Lorraine, Metz 57070, France

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Abstract

Fabrication of microscale and nanoscale silicon waveguide devices requires patterning silicon, but until recently, exploitation of the technology has been restricted by the difficulty of forming ever-small features with minimum linewidth fluctuation. A technique was developed for fabricating such devices achieving vertical sidewall profile, smooth sidewall roughness of less than 10 nm, and fine features of 40 nm. Subsequently, silicon microring resonator and silicon-grating coupler were realized using this technique.

Keywords nanofabrication silicon waveguide roughness microring resonator grating coupler

Corresponding Author(s): ZHOU Zhiping,Email:zjzzhou@pku.edu.cn

Issue Date: 05 September 2009

Cite this article:

Yao CHEN,Junbo FENG,Zhiping ZHOU, et al. Simple technique to fabricate microscale and nanoscale silicon waveguide devices[J]. Front Optoelec Chin, 2009, 2(3): 308-311.

URL:

https://academic.hep.com.cn/foe/EN/10.1007/s12200-009-0049-1
https://academic.hep.com.cn/foe/EN/Y2009/V2/I3/308

Fig.1 Patterns of e-beam resist HSQ

Fig.2 Etched sidewall profile of silicon waveguide

Fig.3 Silicon microring resonator

Fig.4 Nanoscale silicon-grating coupler

Fig.5 Comparison results by two different developers

Fig.6 Dose map for patterning silicon-grating coupler

Fig.7 Striation roughness

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