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Measurement of optical mirror with a small-aperture interferometer |
Ya GAO1, Hon Yuen TAM2, Yongfu WEN1, Huijing ZHANG1, Haobo CHENG1() |
1. School of Optoelectronics, Beijing Institute of Technology, Beijing 100081, China; 2. Department of Manufacturing Engineering and Engineering Management, City University of Hong Kong, Hong Kong, China |
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Abstract In this paper, the principle of subaperture stitching interferometry was introduced. A testing stage with five degrees of freedom for stitching interferometry was built. A model based on least-squares method and error averaging method for data processing was established, which could reduce error accumulation and improve the precision. A 100 mm plane mirror was measured with a 50 mm aperture interferometer by means of stitching interferometry. Compared with the results by a 100 mm interferometer, peak to valley (PV) and root mean square (RMS) of the phase distribution residual are 0.0038λ and 0.0004λ, respectively. It proved that the model and method are helpful for large optical measurement.
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Keywords
subaperture stitching
interferometry
residual error
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Corresponding Author(s):
CHENG Haobo,Email:chenghaobo@tsinghua.org.cn
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Issue Date: 05 June 2012
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