Effects of enhanced nucleation on the growth
and thermal performance of diamond films deposited on BeO by hot filament
CVD technique
Effects of enhanced nucleation on the growth
and thermal performance of diamond films deposited on BeO by hot filament
CVD technique
YU Zhi-ming1, FANG Mei1, XIAO Zhu2
1.School of Materials Science and Engineering, Central South University；Laboratory of Functional Thin Film (Ministry of Education), Central South University; 2.School of Materials Science and Engineering, Central South University；Key Laboratory of Nonferrous Metal Materials Science and Engineering (Ministry of Education), Central South University;
Abstract：A method of controlling the feeding concentration of methane was applied in a hot-filament chemical vapor deposition (HFCVD) in order to improve the nucleation of diamond on the beryllium oxide substrates. The nucleation density and the morphologies of diamond were investigated by scanning electron microscopy (SEM) and atomic force microscopy (AFM) while the thermal conductivities of substrates and the composites were detected by laser-diathermometer. The results show that the diamond thin film is in larger grain size with lower roughness when CH4 and H2 enter the chamber, respectively, rather than as a mixture, and the composites’ conductivity soared by 21%–31% compared with BeO substrates. At the conditions of separated gas entry, several projects with changes of the CH4 flux during depositing were designed to discuss the influence of CH4 concentration on diamond nucleation. The uniform and compact diamond thin films were acquired when the ratio of CH4:H2 at nucleation stage was in the range of 4%–8%.
出版日期: 2008-12-05
引用本文:
. Effects of enhanced nucleation on the growth
and thermal performance of diamond films deposited on BeO by hot filament
CVD technique[J]. Frontiers of Materials Science in China, 2008, 2(4): 369-374.
YU Zhi-ming, FANG Mei, XIAO Zhu. Effects of enhanced nucleation on the growth
and thermal performance of diamond films deposited on BeO by hot filament
CVD technique. Front. Mater. Sci., 2008, 2(4): 369-374.
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