1. State Key Laboratory of Nuclear Physics and Technology, Peking University, Beijing 100871, China; 2. Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600, China
In the past decade, nanopores have been developed extensively for various potential applications, and their performance greatly depends on the surface properties of the nanopores. Atomic layer deposition (ALD) is a new technology for depositing thin films, which has been rapidly developed from a niche technology to an established method. ALD films can cover the surface in confined regions even in nanoscale conformally, thus it is proved to be a powerful tool to modify the surface of the synthetic nanopores and also to fabricate complex nanopores. This review gives a brief introduction on nanopore synthesis and ALD fundamental knowledge, and then focuses on the various aspects of synthetic nanopores processing by ALD and their applications, including single-molecule sensing, nanofluidic devices, nanostructure fabrication and other applications.
. Surface engineering of synthetic nanopores by atomic layer deposition and their applications[J]. Frontiers of Materials Science, 2013, 7(4): 335-349.
Ce-Ming WANG, De-Lin KONG, Qiang CHEN, Jian-Ming XUE. Surface engineering of synthetic nanopores by atomic layer deposition and their applications. Front Mater Sci, 2013, 7(4): 335-349.
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