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Impact of surface phase coexistence on the development of step-free areas on Si(111) |
Andreas FISSEL(),Ayan Roy CHAUDHURI,Jan KRÜGENER,Philipp GRIBISCH,H. Jörg OSTEN |
Institute of Electronic Materials and Devices, Leibniz University Hannover, Schneiderberg 32, 30167 Hannover, Germany |
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Abstract The step-flow growth condition of Si on Si(111) near the (7×7)-"1×1" surface phase transition temperature TC are analyzed within the framework of Burton--Cabrera--Frank theory. In particular, coexistence of both surface phases well below TC and their specific influence on the step-flow growth behavior are considered. We presume that under dynamical condition of growth, the surface initially covered by only the (7×7) phase separates into domains surrounded by "1×1" areas. On such a surface, the overall supersaturation should be reduced drastically compared to a surface with only (7×7), resulting in much larger critical terrace width for nucleation.
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Keywords
molecular beam epitaxy
step-flow growth mode
surface superstructure
silicon
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Corresponding Author(s):
Andreas FISSEL
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Online First Date: 21 April 2015
Issue Date: 23 July 2015
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1 |
Fissel A, Krügener J, Osten H J. Preparation of large step-free mesas on Si(111) by molecular beam epitaxy. physica status solidi (c), 2012, 10–11: 2050–2053
|
2 |
Krügener J, Osten H J, Fissel A. Morphology of mesa surfaces on Si(111) prepared by molecular beam epitaxy at temperatures around the (7×7)-"1×1" surface phase transition. Surface Science, 2013, 618: 27–35
|
3 |
Hannon J B, zu Heringdorf F J, Tersoff J, . Phase coexistence during surface phase transitions. Physical Review Letters, 2001, 86(21): 4871–4874
|
4 |
Hannon J B, Tersoff J, Tromp R M. Surface stress and thermodynamic nanoscale size selection. Science, 2002, 295(5553): 299–301
|
5 |
Hannon J B, Tersoff J, Reuter M C, . Influence of supersaturation on surface structure. Physical Review Letters, 2002, 89(26): 266103 (4 pages)
|
6 |
Yang Y, Williams E D. High atom density in the "1×1" phase and origin of the metastable reconstructions on Si(111). Physical Review Letters, 1994, 72(12): 1862–1865
|
7 |
Burton W K, Cabrera N, Frank F C. The growth of crystals and the equilibrium structure of their surfaces. Philosophical Transactions of the Royal Society of London. Series A: Mathematical and Physical Sciences, 1951, 243(866): 299–358
|
8 |
Desai P D. Thermodynamic properties of iron and silicon. Journal of Physical and Chemical Reference Data, 1986, 15(3): 967–982
|
9 |
Peng A B, Man K L, Altman M S, . Step line tension and step morphological evolution on the Si(111) (1×1) surface. Physical Review B, 2008, 77: 115424 (12 pages)
|
10 |
Pimpinelli A, Villain J, Wolf D E, . Equilibrium step dynamics on vicinal surfaces. Surface Science, 1993, 295(1–2): 143–153
|
11 |
Hibino H, Hu C W, Ogino T, . Decay kinetics of two-dimensional islands and holes on Si(111) studied by low-energy electron microscopy. Physical Review B, 2001, 63: 245402 (8 pages)
|
12 |
Ol'shanetskii B Z, Repinskii S M, Shklyaev A A. Possibility of investigating surface self-diffusion of silicon by slow-electron diffraction methode. Journal of Experimental and Theoretical Physics Letters, 1978, 27(7): 378–380
|
13 |
Hannon J B, Hibino H, Bartelt N C, . Dynamics of the silicon (111) surface phase transition. Nature, 2000, 405(6786): 552–554
|
14 |
Watanabe H, Ichikawa M. Kinetics of vacancy diffusion on Si(111) surfaces studied by scanning reflection electron microscopy. Physical Review B, 1996, 54(8): 5574–5580
|
15 |
Cho K, Kaxiras E. Intermitted diffusion on the reconstructed Si(111) surface. Europhysics Letters, 1997, 39(3): 287–292
|
16 |
Bedair S M. Activation energy for migration of silicon (111) face. Surface Science, 1974, 42(2): 595–599
|
17 |
Sato T, Kitamura Sh, Iwatsuki M. Surface diffusion of adsorbed Si atoms on the Si(111)7×7 surface studied by atom-tracking scanning tunneling microscopy. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2000, 18(3): 960–964
|
18 |
NoorBatcha I, Raff L M, Thompson D L, . A phenomeno-logical approach to the calculation of diffusion coefficient for Si on Si(111) using classical trajectories. Journal of Chemical Physics, 1985, 82(3): 1543–1550
|
19 |
Hibino H, Homma Y, Uwaha M, . Step wandering induced by homoepitaxy on Si(111) during "1×1"-7×7 phase transition. Surface Science, 2003, 527(1–3): L222–L238
|
20 |
Zinovyev V A, Balandin V Yu, Aleksandrov L N, . Step flow at homoepitaxy of Si(111) with (7×7)?(1×1) superstructure phase transition. physica status solidi (b), 1992, 173: K5–K9
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