Advances in topological materials

doi:10.1007/s11467-011-0224-x

Front. Phys.

2012, Vol. 7

Issue (2) : 147-147 https://doi.org/10.1007/s11467-011-0224-x

EDITORIAL

Advances in topological materials

Shoucheng Zhang¹(

), Zhong Fang²(

), Qi-Kun Xue³(

)

1. JG Jackson and CJ Wood Professor of Physics, Department of Physics, Stanford University, USA; 2. Institute of Physics, Chinese Academy of Sciences, China; 3. Department of Physics, Tsinghua University, China

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Corresponding Author(s): Zhang Shoucheng,Email:sczhang@stanford.edu; Fang Zhong,Email:zfang@aphy.iphy.ac.cn; Xue Qi-Kun,Email:qkxue@tsinghua.edu.cn

Issue Date: 01 April 2012

Cite this article:

Shoucheng Zhang,Zhong Fang,Qi-Kun Xue. Advances in topological materials[J]. Front. Phys. , 2012, 7(2): 147-147.

URL:

https://academic.hep.com.cn/fop/EN/10.1007/s11467-011-0224-x
https://academic.hep.com.cn/fop/EN/Y2012/V7/I2/147

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