SiO2 passivation layer grown by liquid phase deposition for silicon solar cell application

doi:10.1007/s11708-016-0429-3

Frontiers in Energy

2017, Vol. 11

Issue (1): 52-59 https://doi.org/10.1007/s11708-016-0429-3

本期目录

SiO₂ passivation layer grown by liquid phase deposition for silicon solar cell application

Yanlin CHEN¹,Sihua ZHONG¹(

),Miao TAN¹,Wenzhong SHEN²(

)

¹. Institute of Solar Energy, and Key Laboratory of Artificial Structures and Quantum Control (Ministry of Education), Department of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai 200240, China
². Institute of Solar Energy, and Key Laboratory of Artificial Structures and Quantum Control (Ministry of Education), Department of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai 200240; Collaborative Innovation Center of Advanced Microstructures, Nanjing 210093, China

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Abstract：

Surface passivation is one of the primary requirements for high efficient silicon solar cells. Though the current existed passivation techniques are effective, expensive equipments are required. In this paper, a comprehensive understanding of the SiO₂ passivation layer grown by liquid phase deposition (LPD) was presented, which was cost-effective and very simple. It was found that the post-annealing process could significantly enhance the passivation effect of the LPD SiO₂ film. Besides, it was revealed that both chemical passivation and field-effect passivation mechanisms played important roles in outstanding passivation effect of the LPD SiO₂ film through analyzing the minority carrier lifetime and the surface recombination velocity of n-type and p-type silicon wafers. Although the deposition parameters had little influence on the passivation effect, they affected the deposition rate. Therefore, appropriate deposition parameters should be carefully chosen based on the compromise of the deposition rate and fabrication cost. By utilizing the LPD SiO₂ film as surface passivation layer, a 19.5%-efficient silicon solar cell on a large-scale wafer (156 mm × 156 mm) was fabricated.

Key words： Si solar cell passivation SiO₂ liquid phase deposition carrier lifetime

收稿日期: 2016-07-08 出版日期: 2016-11-16

Corresponding Author(s): Sihua ZHONG,Wenzhong SHEN

引用本文:

. [J]. Frontiers in Energy, 2017, 11(1): 52-59.
Yanlin CHEN,Sihua ZHONG,Miao TAN,Wenzhong SHEN. SiO₂ passivation layer grown by liquid phase deposition for silicon solar cell application. Front. Energy, 2017, 11(1): 52-59.

链接本文:

https://academic.hep.com.cn/fie/CN/10.1007/s11708-016-0429-3
https://academic.hep.com.cn/fie/CN/Y2017/V11/I1/52

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