Controlling nested wrinkle morphology through the boundary effect on narrow-band thin films

doi:10.1007/s11465-017-0458-6

Front. Mech. Eng.

2019, Vol. 14

Issue (2) : 235-240 https://doi.org/10.1007/s11465-017-0458-6

RESEARCH ARTICLE

Controlling nested wrinkle morphology through the boundary effect on narrow-band thin films

Hanyang XU, Tielin SHI, Guanglan LIAO, Qi XIA(

)

The State Key Laboratory of Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074, China

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Abstract

We describe the formation of nested wrinkles created by the thermal mismatch between a narrow-band thin film and a compliant substrate. When a film is described as “narrow-band”, it literally means that the film band width is much shorter than its length; more precisely, it means that the width is comparable with the wavelength of the wrinkles. A silicon mask was used during film sputtering to create narrow-band films on poly (dimethylsiloxane) substrate, thus creating regular boundaries to steer local stresses and control wrinkle morphology. Disordered nano-scale wrinkles were found nested within highly ordered micro-scale sinusoidal wrinkles. The formation of nested wrinkles was explained through the amplitude and wavelength saturation of nano-scale wrinkles. The disordered morphology of nano-scale wrinkles and the highly ordered morphology of micro-scale wrinkles were explained by using the boundary effect.

Keywords nested and hierarchical wrinkles morphology amplitude saturation boundary effect

Corresponding Author(s): Qi XIA

Just Accepted Date: 07 June 2017 Online First Date: 10 July 2017 Issue Date: 22 April 2019

Cite this article:

Hanyang XU,Tielin SHI,Guanglan LIAO, et al. Controlling nested wrinkle morphology through the boundary effect on narrow-band thin films[J]. Front. Mech. Eng., 2019, 14(2): 235-240.

URL:

https://academic.hep.com.cn/fme/EN/10.1007/s11465-017-0458-6
https://academic.hep.com.cn/fme/EN/Y2019/V14/I2/235

Fig.1 Schematic illustration of the fabrication process. (a) A silicon mask is covered on the PDMS; (b) PDMS is heated to 80 °C and the narrow-band copper films are deposited; (c) films and substrate are cooled to room temperature when the mask is removed

Fig.2 Disordered wrinkles nested within highly ordered sinusoidal wrinkles. Nested wrinkles obtained with film thicknesses of (a) 500 nm, (b) 400 nm, and (c) 300 nm, respectively; fine details of the nested wrinkles obtained with film thicknesses of (d) 500 nm, (e) 400 nm, and (f) 300 nm, respectively (corresponding with the red area in (a)–(c)). The images are obtained by the Atomic Force Microscope (AFM), Bruker INNOVA

Fig.3 Relationships among G1 wrinkles’ wavelength, and the thickness of the narrow-band film

Fig.4 Relationships among G2 wrinkles’ wavelength, and thickness of the narrow-band film

Fig.5 Relationships among G1 wrinkles’ amplitude, and thickness of the narrow-band film

Fig.6 Relationships among G2 wrinkles’ amplitude, and thickness of the narrow-band film

Fig.7 Disordered wrinkles nested within disordered wrinkles. Nested wrinkles obtained with film thicknesses of (a) 500 nm, (b) 400 nm, and (c) 300 nm, respectively

Fig.8 Disordered wrinkles obtained with film thicknesses of (a) 500 nm, (b) 400 nm, and (c) 300 nm, respectively (obtained by laser microscope, Keyence, vk-x200); fine details of wrinkles obtained with film thicknesses of (d) 500 nm, (e) 400 nm, and (f) 300 nm, respectively (obtained with the AFM, Bruker INNOVA)

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