Characterisation of a microwave induced plasma torch for glass surface modification

doi:10.1007/s11465-020-0603-5

Front. Mech. Eng.

2021, Vol. 16

Issue (1) : 122-132 https://doi.org/10.1007/s11465-020-0603-5

RESEARCH ARTICLE

Characterisation of a microwave induced plasma torch for glass surface modification

Adam BENNETT¹, Nan YU²(

), Marco CASTELLI³, Guoda CHEN⁴, Alessio BALLERI⁵, Takuya URAYAMA⁶, Fengzhou FANG²(

)

¹. Surface Engineering and Precision Institute, Cranfield University, Cranfield MK43 0AL, UK
². Centre for Micro/Nano Manufacturing Technology (MNMT-Dublin), University College Dublin, Dublin D04 V1W8, Ireland
³. Manufacturing Technology Centre (MTC), Coventry CV7 9JU, UK
⁴. Key Laboratory of E&M, Ministry of Education & Zhejiang Province, Zhejiang University of Technology, Hangzhou 310014, China
⁵. Centre for Electronic Warfare, Information and Cyber, Cranfield University, Shrivenham SN6 8LA, UK
⁶. Adtec Plasma Technology Co., Ltd., Fukuyama, Hiroshima 712-0942, Japan

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Abstract

Microwave induced plasma torches find wide applications in material and chemical analysis. Investigation of a coaxial electrode microwave induced plasma (CE–MIP) torch is conducted in this study, making it available for glass surface modification and polishing. A dedicated nozzle is designed to inject secondary gases into the main plasma jet. This study details the adaptation of a characterisation process for CE–MIP technology. Microwave spectrum analysis is used to create a polar plot of the microwave energy being emitted from the coaxial electrode, where the microwave energy couples with the gas to generate the plasma jet. Optical emission spectroscopy analysis is also employed to create spatial maps of the photonic intensity distribution within the plasma jet when different additional gases are injected into it. The CE–MIP torch is experimentally tested for surface energy modification on glass where it creates a super-hydrophilic surface.

Keywords microwave induced plasma spectrum analysis surface modification

Corresponding Author(s): Nan YU,Fengzhou FANG

Just Accepted Date: 29 October 2020 Online First Date: 07 December 2020 Issue Date: 11 March 2021

Cite this article:

Adam BENNETT,Nan YU,Marco CASTELLI, et al. Characterisation of a microwave induced plasma torch for glass surface modification[J]. Front. Mech. Eng., 2021, 16(1): 122-132.

URL:

https://academic.hep.com.cn/fme/EN/10.1007/s11465-020-0603-5
https://academic.hep.com.cn/fme/EN/Y2021/V16/I1/122

Fig.1 Schematic of the plasma surface processing. (a) Experimental setup of plasma processing using CE–MIP torch; (b) Working principle of the CE–MIP torch for reactive plasma jet generation. CE–MIP: Coaxial electrode microwave induced plasma; MFC: Mass flow controller.

Fig.2 Design of a divergent nozzle with microfluidic channels for the injection of secondary gases. (a) Schematic of the CE–MIP torch; (b) cross-section of the bespoke nozzle; (c) CE–MIP torch nozzle with two gas injection tubes; (d) CAD model of the nozzle design, showing the micro holes’ distribution. CE–MIP: Coaxial electrode microwave induced plasma.

Fig.3 Experimental setup for microwave spectrum analysis. (a) Six degrees of freedom of the CE–MIP torch; (b) microwave propagation; (c) receiving antenna; (d) CE–MIP torch mounted on a precision motion stage; (e) signal analyser. CE–MIP: Coaxial electrode microwave induced plasma.

Fig.4 Emission intensity from the receiving antenna. (a) Horizontal polarisation; (b) vertical polarisation.

Fig.5 Measured electric field with different CE–MIP torch configurations: (a) Coaxial electrode only; (b) coaxial electrode with quartz tube; (c) coaxial electrode with quartz tube plus a chamber; (d) whole MIP torch attached with the bespoke nozzle. Note: The MIP torch contains four elements, as shown in this figure, ① coaxial electrode, ② quartz tube, ③ resonant chamber, and ④ bespoke nozzle. The adjustment of pitch and yaw are given in this figure. CE–MIP: Coaxial electrode microwave induced plasma; MIP: Microwave induced plasma.

Fig.6 Measured electric field with different CE–MIP torch configurations. ① Coaxial electrode, ② quartz tube, ③ resonant chamber, and ④ bespoke nozzle with two versions # 1 and # 2.

Fig.7 Photon emission intensity spatial maps with different gas injections: (a) Main gas= 1 L/min Ar; (b) main gas= 1 L/min Ar, and secondary gas= 0.01 L/min Ar; (c) main gas= 1 L/min Ar, and secondary gas= 0.01 L/min SF₆; (d) main gas= 1 L/min Ar, and secondary gas= 0.01 L/min CF₄.

Fig.8 Intensity of wavelength 801.5 nm. (a) Intensity of plasma jet cross section, with data acquisition at 1 mm downstream from the nozzle; (b) comparison of the intensity of the plasma jet with different secondary gases injected. The plasma jet analysis locus is 3.3 mm downstream from the nozzle at the centre of axis.

Fig.9 Surface energy modification experiment and measurement. (a) Experimental setup for CE–MIP treatment of CSP glass, located on a X?Y motion stage; (b) measurement machine for the water contact angle on the CSP glass samples. CE–MIP: Coaxial electrode microwave induced plasma; CSP: Concentrating solar power.

Fig.10 Measurement result of the modified glass surface. (a) Water contact angle versus plasma torch travel speed, for a different number of passes; (b) water contact angle versus aging time, with plasma torch travel speed varying between 1 and 5 m/min. All samples were plasma processed with three passes.

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