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Effects of low pH and aluminum stresses on common
beans ( Phaseolus vulgaris ) differing
in low-phosphorus and photoperiod responses |
| Hai NIAN1,Cunyi YANG1,He HUANG1,Hideaki MATSUMOTO2, |
| 1.College of Agriculture,
South China Agricultural University, Guangzhou 510642, China; 2.Research Institute for
Bioresources Okayama University, Kurashiki 710-0046, Japan; |
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Abstract Using common beans differing greatly in the response to photoperiod and low-phosphorus (P) stress, we investigated their responses to acidity and aluminum (Al) toxicity and the relationship between Al tolerance and organic acid exudation under Al or low P stress. A genotype Ginshi was found to be sensitive to low pH treatment. When exposed to pH 4.5, serious curvature in the root tips of cv. Ginshi was observed; however, it was completely corrected by the application of 5 or 10 μmol/L AlCl3; increasing calcium (Ca) could ameliorate Al toxicity, but it could not correct root curvature at pH 4.5. Common beans showed significant differences in both root growth and Al tolerance, and the varieties from the Andes were more tolerant to Al toxicity than those from the Mesoamerican origin. In the presence of 50 μmol/L AlCl3, all the common bean genotypes exuded citrate, and a significant difference in the amounts of citrate was observed among genotypes. The genotypes originated in the Mesoamerica tended to release more citrate than other origins in the presence of Al. The P-inefficient genotype DOR364 exuded more citrate than the P-efficient genotype G19833 in the presence of 50 μmol/L AlCl3, whereas no organic acids were detected in root exudates under low-P stress. A reduction of citrate exudation in the DOR364, but a slight increase of citrate exudation in the G19833, was observed under Al stress after they were exposed to 6-d P starvation. These results suggest that different low-P or Al tolerance in common beans might not be associated with organic acid exudation.
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| Keywords
common bean
low-pH
aluminum
organic acid exudation
phosphorus deficiency
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Issue Date: 05 December 2009
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