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Frontiers of Mechanical Engineering

ISSN 2095-0233

ISSN 2095-0241(Online)

CN 11-5984/TH

Postal Subscription Code 80-975

2018 Impact Factor: 0.989

Front Mech Eng Chin    2010, Vol. 5 Issue (4) : 370-375    https://doi.org/10.1007/s11465-010-0107-9
RESEARCH ARTICLE
Development of new transient liquid phase system Au-Sn-Au for microsystem technology
Kirsten BOBZIN, Nazlim BAGCIVAN, Lidong ZHAO, Stefania FERRARA, Jan PERNE()
Surface Engineering Institute, RWTH Aachen University, Augustinerbach 4-22, 52062 Aachen, Germany
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Abstract

In the last decade, microsystems evolved to decisive technology in many technical applications. With increasing requirements on the performance of microsystems, more and more dissimilar materials are used in the same assembly. Correspondingly, suitable joining methods are required to fulfil the requirements on good properties of joints. In this study, a new transient liquid phase (TLP) system Au-Sn-Au was developed for potential medical applications in hybrid microsystems. The high and low melting phases Au and Sn were deposited onto diverse substrates by magnetron-sputter-ion plating. The coated substrates were soldered in a microsoldering station under different conditions. The influence of soldering conditions on the microstructure and properties of the joints was investigated. Results show that the developed solder led to high-quality joints that can be used in microsystems for medical applications.

Keywords transient liquid phase      microtechnology      soldering      diffusion      physical vapor deposition (PVD)     
Corresponding Author(s): PERNE Jan,Email:perne@iot.rwth-aachen.de   
Issue Date: 05 December 2010
 Cite this article:   
Kirsten BOBZIN,Nazlim BAGCIVAN,Lidong ZHAO, et al. Development of new transient liquid phase system Au-Sn-Au for microsystem technology[J]. Front Mech Eng Chin, 2010, 5(4): 370-375.
 URL:  
https://academic.hep.com.cn/fme/EN/10.1007/s11465-010-0107-9
https://academic.hep.com.cn/fme/EN/Y2010/V5/I4/370
Fig.1  Transient liquid phase process. (a) Initial solder composition; (b) solder at soldering temperature, diffusion of high-melting elements to liquid phase; (c) soldered joint after isothermal solidification
pressure/Papower/Wsubstrate temperature/°CPulse/kHzcooling break/min
Au-Sn2-0.5250-100-35/55015-30
Tab.1  Parameters for MSIP process
soldering temperature/°Cduration/mincompression/MPa
27-400600.5
Tab.2  Soldering parameters
Fig.2  Cross-section of an Au-Sn-Ti coated glass substrate
Fig.3  Calotte projection of an Au-Sn-Ti coated glass substrate
Fig.4  Cross-section of joint with glass substrates soldered at 270°C for 30 min
Fig.5  Cross-section of joint with glass and Si substrates soldered at 400°C for 1 h
Fig.6  Cross-section of joint with AlO and glass substrates soldered at 400°C for 1 h
Fig.7  Left: soldered at 270°C for 60 min with resulting phases AuSn-(1), AuSn -(2), and AuSn -(3); right: soldered at 400°C for 60 min with homogeneous gold rich phase (more than 10 at.-% Sn) at (1), (2), and (3)
Fig.8  Phase diagram of Au-Sn
silicon/glassAlN/GaAscopper/AlNsilicon/Al2O3steel/Al2O3
shear strength /MPa42±2.445±2.846±2.844±2.658±3.4
Tab.3  Shear strengths of soldered joints with different substrates
substrate materialscycles
copper/silicon100
silicon/glass (pyrex)100
Al2O3/steel (1.4401)87
copper/AlN100
AlN/Silicon100
GaAs/AlN100
Tab.4  Number of thermo-shock cycles without the occurrence of macroscopical damages
Fig.9  Soldered joint after four days in simulated body fluid
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